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Nitridation of atomic-layer-deposited HfO2/Al2O3 stacks by NH3 annealing
  • ISSN号：0040-6090
  • 期刊名称：Thin Solid Films
  • 时间：2013.2.1
  • 页码：230-233
  • 相关项目：分子层淀积量子阱有机薄膜晶体管的基础研究
作者： Sun, Qing-Qing|Zhou, Peng|Lu, Hong-Liang|Zhang, David Wei|
同期刊论文项目
分子层淀积量子阱有机薄膜晶体管的基础研究
期刊论文 47
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