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Reactively sputtered HfO2 and Ba(Zr0.2Ti0.8)O-3-HfO2 dielectrics for metal-insulator-metal capacitor
  • ISSN号：0167-9317
  • 期刊名称：Microelectronic Engineering
  • 时间：2013.6
  • 页码：96-99
  • 相关项目：分子层淀积量子阱有机薄膜晶体管的基础研究
作者： Xu, Hui|Zhang, Qiu-Xiang|Ding, Shi-Jin|Zhang, David Wei|
同期刊论文项目
分子层淀积量子阱有机薄膜晶体管的基础研究
期刊论文 47
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