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Annealing-Ambient-Dependent Thermal Stability of Ultrathin AlOxNy Films Grown by Metalorganic Chemic
  • ISSN号：1947-2935
  • 期刊名称：Science of Advanced Materials
  • 时间：2012.10.1
  • 页码：1078-1084
  • 相关项目：HfTiON/TaON叠层高k栅介质薄膜的制备及其在锗场效应晶体管中的应用探索
作者： He Gang|Sun Zhaoqi|Chen, Hanshuang|Fang, Zebo|Chen, Xiaoshuang|Wang, Peihong|Shi, Shiwei|Liu, Mao|
同期刊论文项目
HfTiON/TaON叠层高k栅介质薄膜的制备及其在锗场效应晶体管中的应用探索
期刊论文 10
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