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Microstructure characterization of microcrystalline silicon thin films deposited by very high freque
  • ISSN号：0040-6090
  • 期刊名称：Thin Solid Films
  • 时间：0
  • 页码：861-865
  • 相关项目：基于硅基薄膜太阳电池沉积过程中的瞬态与稳态等离子体空间反应机理研究
作者： Zhang, He|Zhang, Xiaodan|Wei, Changchun|Sun, Jian|Geng, Xinhua|Xiong, Shaozhen|Zhao, Ying|
同期刊论文项目
基于硅基薄膜太阳电池沉积过程中的瞬态与稳态等离子体空间反应机理研究
期刊论文 26 会议论文 4 专利 4
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