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脉冲缓冲层对AlN外延层位错密度的影响
  • ISSN号:1003-353X
  • 期刊名称:《半导体技术》
  • 时间:0
  • 分类:TQ174.758[化学工程—陶瓷工业;化学工程—硅酸盐工业] TN305.93[电子电信—物理电子学]
  • 作者机构:[1]State Key Laboratory for Mesoscopic Physics, Department of Physics, Peking University, Beijing 100871, China
  • 相关基金:Project supported by the National Natural Science Foundation of China (Grant Nos. 10774001, 60736033, 60876041 and 60577030), National Basic Research Program of China (Grant Nos. 2006CB604908 and 2006CB921607), and the National Key Basic Research and Development Program of China (973 Project) (Grant No. TG2007CB307004).
中文摘要:

This paper investigates the temperature dependence of the specific resistance in annealed V/Al/V/Au (15 nm/85 nm/20 nm/95 nm) contacts on n-Al0.4Ga0.6 N. Contacts annealed at 700C and higher temperatures show Ohmic behaviour. Annealing at 800 C produces the lowest contact resistance. Samples annealed at 800C have been analysed by using cross-sectional transmission electron microscopy and an energy dispersive x-ray spectrum. Limited reaction depths are observed between V-based contacts and n-AlGaN. The VN grains are found to form in the contact layer of the annealed samples,which can be considered as the key to the successful formation of Ohmic contact. The contact layer adjacent to AlGaN material consists of V-Al-Au-N,AlN and AlAu alloys.

英文摘要:

This paper investigates the temperature dependence of the specific resistance in annealed V/Al/V/Au (15 nm/85 nm/20 nm/95 nm) contacts on n-A10.4Ga0.6N. Contacts annealed at 700 ℃ and higher temperatures show Ohmic behaviour. Annealing at 800 ℃ produces the lowest contact resistance. Samples annealed at 800 ℃have been analysed by using cross-sectional transmission electron microscopy and an energy dispersive x-ray spectrum. Limited reaction depths are observed between V-based contacts and n-AlGaN. The VN grains are found to form in the contact layer of the annealed samples, which can be considered as the key to the successful formation of Ohmic contact. The contact layer adjacent to AlGaN material consists of V Al-Au-N, AlN and AlAu alloys.

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期刊信息
  • 《半导体技术》
  • 中国科技核心期刊
  • 主管单位:中国电子科技集团公司
  • 主办单位:中国电子科技集团公司第十三研究所
  • 主编:赵小玲
  • 地址:石家庄179信箱46分箱
  • 邮编:050051
  • 邮箱:informax@heinfo.net
  • 电话:0311-87091339
  • 国际标准刊号:ISSN:1003-353X
  • 国内统一刊号:ISSN:13-1109/TN
  • 邮发代号:18-65
  • 获奖情况:
  • 中文核心期刊,中国科技论文统计用刊
  • 国内外数据库收录:
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  • 被引量:6070