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Study on the key influencing factors in atmospheric pressure plasma processing of fused silica
  • ISSN号:1005-9113
  • 期刊名称:Journal of Harbin Institute of Technology
  • 时间:2014
  • 页码:124-128
  • 分类:TH16[机械工程—机械制造及自动化]
  • 作者机构:[1]School of Mechanical Engineering, Harbin Institute of Technology, Harbin 150001, China
  • 相关基金:Sponsored by the National Natural Science Foundation of China (Grant No.51175123 and 51105112).
  • 相关项目:自由曲面光学零件的大气等离子体射流加工技术基础研究
中文摘要:

In order to get ultra-smooth fused silica surface without subsurface damage efficiently, the atmospheric pressure plasma processing( APPP) method has been developed. It is based on chemical reaction between active radicals excited by plasma and workpiece surface atoms,so the subsurface damage caused by contact stress can be avoided and atomic-level precision can be ensured. In this paper,based on the spectral quantitative analysis theory,the influence laws on material removal rate by the key factors of APPP including the flow rate of reaction gases,the input power,the processing distance and time are discussed. In addition,the results that APPP can remove the damaged surface layer and do not introduce secondary damage are proved via the nanoindentation technology.

英文摘要:

In order to get ultra-smooth fused silica surface without subsurface damage efficiently, the atmospheric pressure plasma processing (APPP) method has been developed. It is based on chemical reaction between active radicals excited by plasma and workpiece surface atoms, so the subsurface damage caused by contact stress can be avoided and atomic-level precision can be ensured. In this paper, based on the spectral quantitative analysis theory, the influence laws on material removal rate by the key factors of APPP including the flow rate of reaction gases, the input power, the processing distance and time are discussed. In addition, the results that APPP can remove the damaged surface layer and do not introduce secondary damage are proved via the nanoindentation technology'.

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期刊信息
  • 《哈尔滨工业大学学报:英文版》
  • 主管单位:工业和信息化部
  • 主办单位:哈尔滨工业大学
  • 主编:
  • 地址:哈尔滨市西大直街92号136信箱
  • 邮编:150001
  • 邮箱:hitxuebao_e@HIT.edu.cn
  • 电话:0451-86414135
  • 国际标准刊号:ISSN:1005-9113
  • 国内统一刊号:ISSN:23-1378/T
  • 邮发代号:14-263
  • 获奖情况:
  • 2000年获黑龙江省科技期刊一等奖,2012年获科技类“2012中国国际影响力优秀学术期刊...
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  • 被引量:160