提高金刚石薄膜的附着力和光洁度是实现CVD金刚石涂层在工模具和耐磨器件领域中广泛应用的关键因素。采用热丝CVD法在光滑WC—Co硬质合金基体表面沉积金刚石薄膜,研究了渗硼预处理新方法对光滑衬底表面抑制Co催石墨化作用和保证金刚石涂层附着力的效果。研究结果表明,采用渗硼预处理方法既能避免研磨、刻蚀和化学腐蚀等加工方法对光滑衬底表面的严重损伤,又能有效抑制Co对金刚石薄膜的不利影响,获得了满足附着力要求的光滑金刚石薄膜,对于拓宽金刚石薄膜的应用领域具有重要意义。
Improving adhesion and roughness of diamond films on WC--Co substrates is the key factor in extensive applications of diamond films. A pretreatment way of boronizing on smooth cobalt --cemented tungsten carbide to improve adhesion and roughness of diamond films had been introduced. A surface layer of stable cobalt borides was formed, and this layer can effectively prevent the diffusion of the cobalt from the surface when diamond films were deposited. On the other hand, this kind of way can protect the fineness of substrate surface well. Results show that under premise of the good adhesion between substrate and diamond film, the roughness of diamond films has been improved effectively. It is of great significance for the industrialization of diamond films.