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Study of nickel silicide formation on Si(1 1 0) substrate
  • ISSN号：0169-4332
  • 期刊名称：Applied Surface Science
  • 时间：0
  • 页码：10571-10575
  • 相关项目：Si(110)衬底上杂质分凝肖特基结源漏形成及其机理研究
作者： Guo, Xiao|Yu, Hao|Jiang, Yu-Long|Ru, Guo-Ping|Zhang, David Wei|Li, Bing-Zong|
同期刊论文项目
Si(110)衬底上杂质分凝肖特基结源漏形成及其机理研究
期刊论文 10 会议论文 8 专利 3
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