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Si3N4 陶瓷轴承内圈 NCD 膜制备中的热流耦合分析
  • 期刊名称：中国陶瓷工业
  • 时间：0
  • 页码：12-15
  • 语言：中文
  • 相关项目：基于陶瓷轴承应用的NCD膜抑晶生长机理及其摩擦学性能研究
作者： 杨春,卢文壮,左敦稳,等|
同期刊论文项目
基于陶瓷轴承应用的NCD膜抑晶生长机理及其摩擦学性能研究
期刊论文 50 获奖 2 专利 4
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Si3N4陶瓷轴承内圈NCD膜制备中的热流耦合分析