中文摘要：

采用垂直提拉法将单层双炔酸膜转移到云母基片上,同时将13层双炔酸膜转移到经过亲水处理的单晶硅片和石英片上,使双炔酸在紫外光照射下发生拓扑聚合制备双炔酸聚合LB膜,并对双炔酸和经紫外光照射后聚合双炔酸LB膜的结构及摩擦磨损特性进行研究.结果表明：双炔酸在可见区无吸收峰,但经紫外光照射后因双炔酸聚合后形成的共轭大π键在可见区出现了吸收峰;双炔酸LB膜均匀平整,厚度约为3.5 nm,聚合后其结构发生变化,厚度降至约1.5 nm;而聚合后双炔酸LB膜的减摩性能基本保持不变,聚合前后双炔酸LB膜的摩擦系数不随载荷而变化,符合阿芒顿定律,其抗磨特性得到明显提高;磨痕结果充分表明聚合双炔酸耐磨性能较好.

英文摘要：

Langmuir-Blodgett （LB） films of monolayer and 13 layers of tricosadiynoic acid （TDA） were transferred onto mica flake, single crystal silicon and quartz substrates treated to be hydrophilic by vertical lifting deposition mode. The structure, friction and wear behaviors of TDA and polymerized TDA LB films under the illumination of UV light were investigated. The results showed that there appeared absorption peaks in visible light because of conjugate -rr bond after irradiation ; the surface of TDA LB film was smooth and orderly, and the thickness was about 3. 5 nm, while the structure of polymerized TDA LB film changed, its thickness was about 1.5 nm; the polymerized TDA LB film maintained the friction properties, friction coefficients of the two LB films did not change at various loads, which was agreement with Amonton＇ s law, while the wear-resistance of the polymerized TDA LB film in- creased obviously, and analysis of the wear track indicated that the polymerized TDA exhibited better wear-resist- ance than that of TDA did.