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Effects of carbon pre-silicidation implant into Si substrate on NiSi
  • ISSN号：0167-9317
  • 期刊名称：Microelectronic Engineering
  • 时间：2014.5.25
  • 页码：178-181
  • 相关项目：超薄可控金属硅化物的形成工艺及机理研究
作者： Wu, Dongping|Ostling, Mikael|Ye, Tianchun|Zhang, Shi-Li|
同期刊论文项目
超薄可控金属硅化物的形成工艺及机理研究
期刊论文 22 会议论文 4
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