采用射频磁控溅射法在玻璃基片上成功制得了GdTbFeCo非晶垂直磁化膜,研究了溅射功率对GdTbFeCo薄膜磁光性能的影响.测量结果表明:基片与靶间距为72mm,溅射功率为75w,溅射气压为0.5Pa,薄膜厚度为120nm时,GdTbFeCo薄膜垂直方向矫顾力达到5966Oe,克尔角为0.413°.
GdTbFeCo magnetic thin films were prepared onto glass substrates by RF magnetron sputtering system. The effect of sputtering power on the magneto-optical properties of the thin films was investigated. It is found that when the distance between the target and substrates, the sputtering power, sputtering pressure and thickness of the GdTbeFeCo thin films are 72 nm, 75 W, 0.5 Pa and 120 nm, respectively,the kerr rotation angle and coercivity that in the perpendicular direction are as high as 0. 413° and 5966 Oe.