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中文摘要：
采用射频磁控溅射法在玻璃基片上制备了NdTbCo／Cr非晶垂直磁化膜。探讨了溅射功率与溅射时间对薄膜磁性能的影响，发现当溅射功率为250W，溅射时间为4min时，垂直膜面方向矫顽力为272．8kA·m^-1，剩磁矩形比达到0．801，可以较好地满足高密度垂直磁记录的要求。研究了Nd掺杂对薄膜磁性能与磁光性能的影响，发现随着Nd掺杂量的增多，薄膜的矫顽力从413．8下降为210．9kA·m^-1，饱和磁化强度与克尔旋转角则分别从144kA·m^-1和0．2720°上升为252kA·m^-1和0．3258°。温度对NdTbCo／Cr薄膜克尔旋转角的影响也与Nd的掺杂量密切相关。
英文摘要：
NdTbCo/Cr amorphous perpendicular magnetization films were prepared onto glass substrate by RF magnetron sputtering. The effects of sputtering power and sputtering time on the magnetic properties were investigated. It is found that when the sputtering power and sputtering time are 250 W and 4 min, respectively, perpendicular coercivity and remanence square ratio reach 272.8 kA·m^-1 and 0.801, respectively, suitable for high density perpendicular magnetic recording. Furthermore, the influence of Nd addition on the magnetic and magneto-optical properties of TbCo/Cr thin films were studied. With the increment of Nd addition, coercivity decreases from 413.8 to 210.9 kA · m^- 1, however, saturation magnetization and Kerr rotation angle increases from 144 kA· m^-1 and 0. 2720° to 252 kA· m^-1 and 0. 3258°, respectively. The temperature dependence of Kerr rotation angle is also related to the concentration of Nd addition.
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