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Impact of source polarization on the imaging of line and space features at 45nm half pitch node - ar
  • 所属机构名称：北京理工大学
  • 会议名称：Conference on Quantum Optics, Optical Data Storage, and Advanced Microlithography
  • 成果类型：会议
  • 会场：Beijing, PEOPLES R CHINA
  • 相关项目：高数值孔径（NA>1）浸没光刻成像中偏振效应研究
作者： Li, Yanqiu|Yuan, Zhou|
同会议论文项目
高数值孔径（NA>1）浸没光刻成像中偏振效应研究
期刊论文 17 会议论文 12
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