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Potential of phase-shifted optical proximity correction for 65 nm T-shaped pattern in high numerical
  • 所属机构名称：北京理工大学
  • 会议名称：51st International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication
  • 成果类型：会议
  • 会场：Denver, CO
  • 相关项目：高数值孔径（NA>1）浸没光刻成像中偏振效应研究
作者： Li, Yanqiu|Gao, Songbo|
同会议论文项目
高数值孔径（NA>1）浸没光刻成像中偏振效应研究
期刊论文 17 会议论文 12
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