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A cathodic arc enhanced middle-frequency magnetron sputter system for deposition of hard protective coatings
  • ISSN号：1674-1056
  • 期刊名称：《中国物理B：英文版》
  • 时间：0
  • 分类：O484.4[理学—固体物理;理学—物理]
  • 作者机构：[1]Accelerator Laboratory, Department of Physics, Wuhan University Wuhan 430072, China
  • 相关基金：Supported by the National Natural Science Foundation of China under contract Nos. 10275049 and 10435060.
作者： HUANG Zhi-Hong YANG Bing FAN Xiang-Jun FU De-Jun[1]
关键词： 阴极弧, 中频磁控管溅射, 类金刚石碳, 内靶, Cathodic arc, Middle frequency magnetron sputtering, Diamond-like carbon.
中文摘要：

Corresponding author, E-mail： djfu@whu.edu.cn

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期刊信息
  • 《中国物理B：英文版》
  • 中国科技核心期刊
  • 主管单位:中国科学院
  • 主办单位:中国物理学会和中国科学院物理研究所
  • 主编：欧阳钟灿
  • 地址：北京 中关村 中国科学院物理研究所内
  • 邮编：100080
  • 邮箱：
  • 电话：010-82649026 82649519
  • 国际标准刊号：ISSN：1674-1056
  • 国内统一刊号：ISSN：11-5639/O4
  • 邮发代号:
  • 获奖情况:
  • 国内外数据库收录:
  • 被引量:406