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脉冲激光沉积Bi0.5(Na0.7K0.1Li0.2)0.5TiO3无铅压电薄膜的研究
  • 期刊名称：功能材料, 2008, 39(6): 915-918.
  • 时间：0
  • 分类：TB43[一般工业技术]
  • 作者机构：[1]四川大学材料科学与工程学院,四川成都610064, [2]表面物理与化学国家重点实验室,四川绵阳621907, [3]香港理工大学应用物理系,香港九龙
  • 相关基金：国家自然科学基金资助项目（59972020,50410179,50572066,20772068）
  • 相关项目：BNT基A位多重复合无铅压电陶瓷的特性与机理研究
关键词： 脉冲激光沉积, Bi0.5(Na0.7K0.1Li0.2)0.5TiO3, 薄膜, pulsed laser deposition （PLD） , Bi0．5（Na0．7K0．1Li0．2）0．5TiO3, film
中文摘要：

采用脉冲激光沉积制备了新型无铅压电Bi0．5（Na0．7K0．1Li0．2）0．5TiO3陶瓷薄膜，分别利用X射线衍射仪、X射线光电子谱、俄歇电子能谱、原子力显微镜及扫描电镜研究了该薄膜的晶体结构、组成成分及表面形貌。结果表明，薄膜基体温度和工作气压对所生长的薄膜影响较大；在SiO2／Si基片上制备Bi0．5（Na0．7K0．1Li0．2）0．5TiO3薄膜的最佳温度和氧气压力分别为600℃和13Pa；利用脉冲激光沉积的薄膜具有精细的表面结构。

英文摘要：

A new type lead-free piezoelectric ceramic film of Bi0.5（Na0.7K0.1Li0.2）0.5TiO3 has been made by pulsed laser deposition. The crystal structure, component and surface pattern of Bi0.5（Na0.7K0.1Li0.2）0.5TiO3 have been studied with X-ray diffraction （XRD）, X-ray photoelectron spectroscopy （XPS）, Auger energy spectroscopy （AES）, atomic force microscopy （AFM）, scanning electron microscopy （SEM） and. The results showed the properties of Bi0.5（Na0.7K0.1Li0.2）0.5TiO3 films are strongly influenced by substrate temperature and oxygen pressure. The substrate temperature 600 ℃ and oxygen pressure 13Pa are found to be optimized parameters for the growth of textured film. The Bi0.5（Na0.7K0.1Li0.2）0.5TiO3 films are fine, uniform and dense.

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