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Optimization of Bosch etch process for vertically stacked Si nanowires
  • ISSN号：0957-4522
  • 期刊名称：Journal of Materials Science: Materials in Electro
  • 时间：2012.1.1
  • 页码：334-342
  • 相关项目：基于硅基一维纳米线的Gate-all-around纳米晶体管的研究
作者： 汪涛|
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基于硅基一维纳米线的Gate-all-around纳米晶体管的研究
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