Continuous surface potential versus voltage equation of intrinsic surrounding-gate MOSFETs and analytic solution from accumulation to strong inversion region
- ISSN号:1674-4926
- 期刊名称:《半导体学报:英文版》
- 时间:0
- 分类:O175[理学—数学;理学—基础数学] TN386.1[电子电信—物理电子学]
- 作者机构:[1]Department of Electronics and Computer Engineering,Hong Kong University of Science & Technology,Hong Kong,China, [2]Micro & Nano Electric Device and Integrated Technology Group,Key Laboratory of Integrated Microsystems,Peking University, Shenzhen Graduate School,Shenzhen 518055,China
- 相关基金:Project supported by the National Natural Science Foundation of China(No.60876027); the Competitive Earmarked Program from the Research Grant Council of Hong Kong SAR China(No.HKUST6289/04E); the Industry Education and Academy Cooperation Program of Guangdong Province China(No.2009B090300318); the Fundamental Research Project of Shenzhen Science & Technology Foundation China(No.JC200903160353A).
关键词:
MOSFET, 表面电位, 电压方程, 解析解, 积累, 解方程, 泊松方程, 原始方程, non-classical CMOS, surrounding-gate MOSFETs, device physics, surface potential, accuracy, continuity issue
中文摘要:
Corresponding author. Email: eejinhe@ust.hk