中文摘要：

采用反应磁控溅射法结合加热控温电源，在光学玻璃基底上制备氮化铝（AlN）薄膜，通过X射线衍射（XRD）技术对薄膜样品物相结构进行分析，利用纳米压痕仪测试薄膜样品的硬度及弹性模量，用椭圆偏振仪及光栅光谱仪测试了薄膜样品的光学性能，分析和研究了基底温度对AlN薄膜的结构及性能的影响。结果表明，用此方法获得的AlN薄膜呈晶态，属于六方晶系，温度对AlN（100）面衍射峰强度影响不大，但对（110）面衍射峰的影响较大，因而温度对AlN的择优取向有一定影响。AlN（100）峰半高宽随温度升高而减小，表明晶粒尺寸随温度升高有变大趋势。随沉积温度升高，薄膜硬度从150℃的8GPa增加到350oC的10GPa左右，随基底温度升高，薄膜的硬度增加。弹性模量随温度的变化趋势与硬度的基本一致。在可见光区域AlN薄膜透过率超过90％，基本属于透明膜。基底温度对薄膜折射率也有较明显影响，折射率大致随温度升高而增大，但由椭偏测试及透射谱线分析得到的厚度结果表明，随温度升高，AlN薄膜的沉积速率下降。

英文摘要：

Aluminum nitride （A1N） thin films were reactively deposited onto glass substrates using reactive magnetron sputtering with a temperature-controllable heater. The phase and structure of the films were analyzed using X-ray diffraction （XRD）. Nano-indenter and ellipsometer as well as grating spectrograph were employed to characterize hardness, elastic module, and optical properties of the films. The effects of substrate temperature on the structure and properties of the AlN films were intensely analyzed and studied. The results showed that the AlN films fabricated by this method were crystalline with a hexagonal structure. The deposition temperature influenced the preferred orientation of the films. It seemed that the plane （110） of AlN was more sensitive to temperature than the plane （100）. The full width of half maximum （FWHM） of peak （100） decreased with increasing temperature, which indicated that the grain size became larger at higher temperature. Both the hardness and the elastic modulus of AIN films increased with the deposition temperature. A hardness of 8 GPa was obtained at 150℃ while a 10 GPa one was achieved at 350℃. In the visible region AlN film was transparent, exhibiting a transmittance over 90%. As the deposition temperature increased, the refractive indices of the films in- creased, while the deposition rate decreased, according to the simulated thickness from the transmittance spectra and by the ellipsometer.