采用离子束溅射沉积Fe/Si多层膜的方法在石英衬底上制备了β-FeSi2薄膜,研究了不同厚度比的Fe/Si多层膜对β-FeSi2薄膜的结构性能、形貌及光学性能的影响。结果表明,厚度比为Fe(2nm)/Si(7.4nm)的多层膜在退火后完全生成了β-FeSi2相,表面致密均匀,其光学带隙为0.84eV,能量为1.0eV光子的吸收系数〉105cm-1。
β-FeSi2 films were prepared on quartz substrates by depositing Fe/Si multilayers with ion beam sputtering method.The effect of different thickness ratio of Fe/Si multilayers on microstructure,surface morphology and optical characteristics of the films were investigated.The results indicate that β-FeSi2 films of Fe(2nm)/Si(7.4nm) multilayers have a homogeneous and dense surface with single β-FeSi2 phase after annealing.A direct gap of 0.84eV was obtained by optical absorption measurement.The optical absorption coefficient is higher than 105cm-1 at 1.0 eV.