中文摘要：

采用水热技术制备的硅纳米孔柱阵列（Si—NPA）是一种具有规则层次结构的硅微米／纳米结构复合体系，具有广谱光吸收和光致发光特性。针对由HF和Fe（NO3）3组成的水热腐蚀溶液体系，研究了溶液组分浓度、腐蚀温度等制备条件对Si—NPA表面硅柱密度及其光致发光性能（PL）的调制作用。结果表明，当蒋蚀温度、HF（或Fe^3＋）浓度固定而变化Fe^3＋（或HF）浓度时，硅柱面密度随HF（或Fe^3＋）浓度的增加呈指数减小趋势，但样品的PL峰位保持不变；当溶液中Fe^3＋，HF浓度固定时，硅柱面密度随腐蚀温度的升高而单调减小，同时样品的PL峰位发生蓝移、发光强度增强。

英文摘要：

Silicon nanoporous pillar array （Si-NPA） is a silicon micron/nanometer structural composite system prepared by hydrothermal etching method, which is characterized by its regular hierarchical structure and excellent properties of broad-band light absorption and photoluminescence （PL）. The modulation effect of the solution concentrations and etching temperature on the surface density of silicon pillars and PL properties of Si-NPA was studied for the hydrothermal etching solution system based on the aqueous solution of HF and Fe（ NO3 ） 3. It was found that when the etching temperature, HF （ Fe^3＋ ） concentration were fixed, the planar densities of silicon pillars for Si- NPA samples would decrease exponentially with the concentration of Fe^3＋（ HF）, but their PL peak positions remain unchanged. On the other hand, when the solution concentrations of Fe^3＋ and HF were fixed, the planar densities of silicon pillars for Si-NPA samples would decrease monotonously with the increment of etching temperature, with an obvious blue-shift of the PL peak positions and an increment of the PL peak intensity.