中文摘要：

采用射频磁控溅射法在单晶硅片和石英玻璃片上沉积TiO2薄膜。通过X射线衍射、原子力显微镜、X射线光电子能谱、紫外可见光谱和荧光发射光谱对薄膜的结构、相组成和表面形貌进行了表征。研究了退火温度对薄膜相结构、表面化学组成、形貌及光学性能的影响。结果表明：沉积的TiO2薄膜为无定形结构,经400℃以上退火后的薄膜出现锐钛矿相,600℃以上退火后的薄膜开始出现金红石相,1 000℃以上退火的薄膜完全转变为金红石相。随着退火温度的升高,晶粒尺寸逐渐增大,仅在950～1000℃时出现减小,1000℃退火的薄膜组成为TiOx。随着退火温度的升高,薄膜的透射率下降,折射率和消光系数有所增加。

英文摘要：

Titania （TiO2） thin films on single crystal silicon substrate and quartz glass substrate were deposited by radio-frequency magnetron sputtering. The structure, components and surface profiles of TiO2 thin films prepared at different annealing temperatures were characterized by X-ray diffraction, atomic force microscopy, X-ray photoelectron spectroscopy, fluorescence emission spectroscopy and ultraviolet-visible （UV-VIS） spectroscopy. The results show that unannealed TiO2 thin films are amorphous. When annealed at 400℃, anatase phase begins to appear. At 600 ℃, rutile phase begins to appear, and at 1000℃, the anatase phase changes into rutile phase completely. With the increase of annealing temperature, the grain size grows, and it decreases only around 950-1 000 ℃. The component of the thin films annealed at q000℃ is TiOx. With the increase of annealing temperature, the transmittance of the thin films decreases, and the refractive index and extinction coefficient of the thin films increase.