本文利用高真空离子束辅助沉积系统(IBAD)在室温下制备了ZrB2、WNx和一系列ZrB2/WNx纳米多层膜,利用XRD、SEM、XP-2台阶仪、纳米力学测试系统表征了薄膜的微结构和机械性能,分析了调制周期对薄膜结构与机械性能的影响。结果表明:ZrB2具有典型的六角相及WNx为六方与立方混合相结构,ZrB2/WNx的多层膜则呈现多晶结构。所有多层膜的纳米硬度与弹性模量值都高于两种个体单层膜材料值。当调制周期Λ=9.6 nm,轰击能量为200 eV时,ZrB2/WNx的多层膜显示出最高的硬度(30.2 GPa)和弹性模量,内应力和划痕测试等机械性能也取得较好的结果。
The ZrB2,WNx and a series of ZrB2/WNx multilayered nanofilms were prepared by ultra-high vacuum IBAD at room temperature.XRD,XP-2 profiler,SEM and nanoindenter were employed to investigate the influence of modulation period on the microstructure and mechanical properties of the films.The results indicated that the ZrB2 films have a hexagonal structure and WNx films have a mixed structure of cube with hexagon,while the ZrB2/WNx multilayered films present polycrystalline structure.And all the nanohardnesses and elastic moduli of multilayered films are higher than those of either ZrB2 or WNx films.When the bombarding energy is 200eV and the modulation period 9.6nm,the ZrB2/WNx multilayered film hardness and elastic modulus both come up to maximum,with better results obtained in internal stress and scratch tests.