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图形硅衬底GaN基发光二极管薄膜去除衬底及AlN缓冲层后单个图形内微区发光及应力变化的研究
  • ISSN号:1000-3290
  • 期刊名称:《物理学报》
  • 时间:0
  • 分类:TN312.8[电子电信—物理电子学]
  • 作者机构:[1]南昌大学、国家硅基LED工程技术研究中心,南昌330047, [2]闽南师范大学LED光源与照明研究中心,漳州363000
  • 相关基金:国家自然科学基金(批准号:51072076,11364034,61334001,21406076,61040060); 国家高技术研究发展计划(批准号:2011AA03A101,2012AA041002); 国家科技支撑计划(批准号:2011BAE32B01)资助的课题~~
中文摘要:

研究了图形硅衬底上外延生长的氮化镓(GaN)基发光二极管(LED)薄膜、去除硅衬底后的无损自由状态LED薄膜以及去除氮化铝(AlN)缓冲层后的自由状态LED薄膜单个图形内的微区光致发光(PL)性能,用荧光显微镜与扫描电镜观测了去除.AlN缓冲层前后LED薄膜断面弯曲状况的变化.研究结果表明:1)去除硅衬底后,自由支撑的LED薄膜朝衬底方向呈柱面弯曲状态,且相邻图形的柱面弯曲方向不一致,当进一步去除AlN缓冲层后薄膜会由弯曲变为平整;2)LED薄膜在去除硅衬底前后同一图形内不同位置的PL谱具有显著差异,而当去除AlN缓冲层后不同位置的PL谱会基本趋于一致;LED薄膜每一位置的PL谱在去除硅衬底后均出现明显红移,进一步去除AlN缓冲层后PL谱出现程度不一的微小蓝移;3)自由支撑的LED薄膜去除AlN缓冲层后,PL光强随激光激发密度变化的线性关系增强,光衰减得到改善.

英文摘要:

At present,there are mainly two kinds of methods to prevent crack and reduce tensile stress of the silicon substrate GaN based light emitting diode(LED) epitaxial films:one is to use the patterned silicon substrate and the other is to grow a thick AlGaN buffer layer.The two kinds of methods have their own advantages and disadvantages.Although the patterned silicon substrate GaN based LED has industrialized and is gradually accepted by the market,there remain many scientific and technical problems,to be resolved,and a lot of research gaps worth studying deeply.Among these problems,to clearly investigate the different micro zone photoluminescence and the stress states in a single-patterned GaN based LED film grown on patterned silicon substrate.The studies of the stress interaction between the buffer layer and the quantum well layer and the effect on the luminescent properties have important guiding significance for improving the quality and performance of the devices.Different micro zone photoluminescence(PL) properties in singlepatterned GaN-based LED films grown on patterned silicon substrates,nondestructive free-standing LED thin film after removing away the silicon substrate,and the free-standing LED films after removing away the AlN buffer layer are studied.The variations of the bending degree of the free-standing LED thin films before and after removing away AlN buffer layer are inverstigated by using fluorescence microscopy and scanning electron microscopy.The results show as follows.1) After removing away the silicon substrate,the free-standing LED film bends to the substrate direction in a cylindrical bending state.After removing away the AlN buffer layer,the LED film bends into flat.2) For LED thin films on silicon substrates or off silicon substrates,their PL spectra have significant differences in different micro zones for the same pattern.When the AlN buffer layer is removed from the substrate its PL spectrum tends to be consistent in the different micro zones of the same pattern.When th

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期刊信息
  • 《物理学报》
  • 北大核心期刊(2011版)
  • 主管单位:中国科学院
  • 主办单位:中国物理学会 中国科学院物理研究所
  • 主编:欧阳钟灿
  • 地址:北京603信箱(中国科学院物理研究所)
  • 邮编:100190
  • 邮箱:apsoffice@iphy.ac.cn
  • 电话:010-82649026
  • 国际标准刊号:ISSN:1000-3290
  • 国内统一刊号:ISSN:11-1958/O4
  • 邮发代号:2-425
  • 获奖情况:
  • 1999年首届国家期刊奖,2000年中科院优秀期刊特等奖,2001年科技期刊最高方阵队双高期刊居中国期刊第12位
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  • 被引量:49876