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Ramp rate dependence of NiSi formation studied by the silicided Schottky contact
  • 期刊名称：Electron. Lett
  • 时间：0
  • 语言：英文
  • 相关项目：多层薄膜固相反应与Co-Ni系硅化物薄膜外延及应用研究
作者： 蒋玉龙|茹国平|李炳宗等|
同期刊论文项目
多层薄膜固相反应与Co-Ni系硅化物薄膜外延及应用研究
期刊论文 15 会议论文 3
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