光栅是一种应用非常广泛的光学元件。通过优化结构尺寸的方法可以获得同样材料光栅的不同辐射特性。本文以一维微结构金属电介质光栅为例,以8~12μm作为目标波段,通过严格耦合波分析与遗传算法相结合的方法对单组金属电介质光栅和双组金属电介质光栅的结构尺寸和光学常数进行双重优化,找到了硅作为电介质材料时的最优结构尺寸和该结构尺寸下电介质材料的最优光学常数。通过该方法,可以用来调控所有目标波段下的辐射特性,为进一步提高一维微结构光栅辐射特性提供了新的途径。
Grating is one of the most wildly applied optic elements.Different radiation property of the grating made from the same material can be obtained by optimizing its geometry dimensions.In this paper,one-dimensional metal-dielectric nano/micro grating is studied,and 8-12 μm is selected as the target wavelength.The best structure dimension of both single-pair and double-pair grating which set silicon as the dielectric material and the best optic constant of the dielectric material at that dimension can be obtained by combining Rigorous Coupled-Wave Analysis and Genetic Algorithm to regulate and control the radiation property at any range of target wavelength.Furthermore,it can be a new way to enhance the radiation property of nano/micro gratings.