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Study on the growth mechanism of tin-doped indium oxide films deposited by direct current pulse magn
  • ISSN号：0040-6090
  • 期刊名称：THIN SOLID FILMS
  • 时间：2013.9.2
  • 页码：415-419
  • 相关项目：a-SiOxNy薄膜化学键结构与缺陷形成机理的研究
作者： Wang, Hualin|Liu, Honglin|Ding, Wanyu|Chai, Weiping|
同期刊论文项目
a-SiOxNy薄膜化学键结构与缺陷形成机理的研究
期刊论文 15 会议论文 2
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