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Study of the SOI MOSFET characteristics of high-k gate dielectric with quantum effect
  • ISSN号：1000-3290
  • 期刊名称：Acta Physica Sinica
  • 时间：2012
  • 页码：247303-247303
  • 相关项目：高k叠层栅AlGaN/GaN MOS-HEMT器件结构实现与可靠性表征
作者： Cao Lei|Liu Hong-Xia|
同期刊论文项目
高k叠层栅AlGaN/GaN MOS-HEMT器件结构实现与可靠性表征
期刊论文 50 专利 1
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期刊信息
  • 《物理学报》
  • 北大核心期刊（2011版）
  • 主管单位:中国科学院
  • 主办单位:中国物理学会 中国科学院物理研究所
  • 主编：欧阳钟灿
  • 地址：北京603信箱(中国科学院物理研究所)
  • 邮编：100190
  • 邮箱：apsoffice@iphy.ac.cn
  • 电话：010-82649026
  • 国际标准刊号：ISSN：1000-3290
  • 国内统一刊号：ISSN：11-1958/O4
  • 邮发代号:2-425
  • 获奖情况:
  • 1999年首届国家期刊奖,2000年中科院优秀期刊特等奖,2001年科技期刊最高方阵队双高期刊居中国期刊第12位
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  • 被引量:49876