中文摘要：

以圆柱形磁控溅射装置为研究对象,下极板外接通电线圈使之产生的磁场,并在上、下极板间施加直流电场,研究电磁场作用下等离子体中电子、离子、中性粒子和亚稳态离子分布。研究以Fortran语言自主编程,对所建立的模型用有限差分方法数值模拟。研究表明：辉光放电起始,电离项为等离子体中离子的主要来源;随着辉光放电趋于平衡,由一次电离、激发态二次电离等组成的累积电离项成为等离子体中离子的主体。达到稳定电离后,电子受磁场约束集中分布于下极板附近,从而使被电离的离子也集中分布于下极板附近。在距下极板15~40 cm区间内,离子分布较均匀。

英文摘要：

The time-evolution of thecylindricalplasma profiles,including the density distributions of the electron,ions,neutral and metastable argon molecules in a DC magnetron sputtering film growth reactor with two parallel electrodes,was physically modeled and numerically simulated. The simulated results show that depending on the time,the electron-impact and cumulative ionizations have a major,but Penning ionization has a minor impact on the density and distributions of electrons and ions in the plasma. To be specific,in the initial stage,e-impact ionization dominates and ion density localized closely below the top-electrode; in the steady stage,the ion density concentrated closely above the bottom-electrode not only because of cumulative ionization dominance,but also because of the high e-density distribution and magnetic field confinement there. The uniform axial distribution of ion density was in 15 ~40 cm range above the bottom-electrode in a steady Ar-plasma.