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Investigation on preparation and diffusion barrier properties of W-Ti thin films
  • ISSN号：0042-207X
  • 期刊名称：Vacuum
  • 时间：0
  • 页码：979-985
  • 相关项目：熔渗材料相控制基础及应用
作者： Wang, Q. X.|Liang, S. H.|
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熔渗材料相控制基础及应用
期刊论文 73 会议论文 6
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