中文摘要：

采用磁激励射频等离子体增强化学气相沉积（M-RF-PECVD）方法,室温下分别在玻璃和Si（100）衬底上制备类金刚石（DLC）薄膜,通过扫描电镜（SEM）、傅里叶红外光谱（FTIR）和Raman光谱对不同沉积条件下制备的薄膜进行表征。结果表明,在反应压强为30 Pa、入射功率为50 W、CH4/Ar=5/90、衬底温度为40℃的实验条件下,制备的含氢DLC薄膜表面平整、结构致密,膜基结合度良好,薄膜中以sp^3键为主。

英文摘要：

Diamond-like carbon films are fabricated respectively on glass substrates and Si（100） substrates in low temperature by Magnetoactive-Radio Frequency-Plasma Enhanced Chemical Vapor Deposition（M-RF-PECVD） method.The film characteristics are investigated by using Fourier transform infrared（FTIR） spectroscopy,Raman spectroscopy and scanning electron microscope（SEM）,respectively.The results show that hydrogenated carbon films prepared at power of 50 W,pressure of 30 Pa,and CH4/Ar ratio of 5/90,have a smooth surface and are composited by sp^3 amorphous carbon mostly.