欢迎您!
东篱公司
退出
申报数据库
申报指南
立项数据库
成果数据库
期刊论文
会议论文
著 作
专 利
项目获奖数据库
位置:
成果数据库
>
期刊
> 期刊详情页
Photoluminescence of silicone oil treated by fluorocarbon plasma
期刊名称:Chin. Phys. B
时间:0
页码:097802-
相关项目:多频等离子体与硅基软物质的作用研究
作者:
Chen Tian, Ye Chao, Yuan Ying, Deng Yan-Hong, Ge S|
同期刊论文项目
多频等离子体与硅基软物质的作用研究
期刊论文 26
会议论文 1
同项目期刊论文
Growth of graphene on SiC at low temperature with the fluorocarbon plasma pre-etching
Effect of Low-frequency Power on F, CF2 Relative Density and F/CF2 Ratio in Fluorocarbon Dual-freque
C2F6、C4F8的双频电容耦合等离子体特性研究
C2F6/O2/Ar plasma chemistry of 60MHz/2MHz dual- frequency discharge and its effect on etching of SiC
CHF3等离子体刻蚀SiCOH低k薄膜的机理分析
O2流量对O2/C4F8等离子体刻蚀SiCOH低k薄膜的影响
Light emission from a-Si:C:O:H films fabricated by C2F6 and O2/C2F6 plasma treating silicone oil liq
O2流量对O2/C2F6等离子体处理的硅油光致发光性能影响
CHF3双频电容耦合放电等离子体特性研究
SiCOH低k介质中低表面粗糙度沟道的刻蚀研究
C_2F_6、C_4F_8的双频电容耦合等离子体特性研究
CHF_3等离子体刻蚀SiCOH低k薄膜的机理分析
O_2流量对O_2/C_4F_8等离子体刻蚀SiCOH低k薄膜的影响
Structural evolution of silicone oil liquid exposed to Ar plasma
Effect of Low-frequency Power on F, CF2 Relative Density and F/CF2 Ratio in Fluorocarbon Dual-Frequency Plasmas
C_2F_6 /O_2 /Ar Plasma Chemistry of 60 MHz/2 MHz Dual-Frequency Discharge and Its Effect on Etching of SiCOH Low-k Film
Photoluminescence of silicone oil treated by fluorocarbon plasma
Effect of Low-Frequency Power on Etching Characteristics of 6H-SiC in C4F8/Ar Dual-Frequency Capacitively Coupled Plasma
Effect of Internal Antenna Coil Power on the Plasma Parameters in 13.56 MHz/60 MHz Dual-Frequency Sputtering*