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Effect of Low-frequency Power on F, CF2 Relative Density and F/CF2 Ratio in Fluorocarbon Dual-Frequency Plasmas
  • ISSN号：1009-0630
  • 期刊名称：《等离子体科学与技术：英文版》
  • 时间：0
  • 分类：O53[理学—等离子体物理;理学—物理] TL631.24[核科学技术—核技术及应用]
  • 作者机构：[1]School of Physics Science and Technology, Jiangsu Key Laboratory of Thin Films,Soochow University, Suzhou 215006, China
  • 相关基金：supported by National Natural Science Foundation of China （Nos. 10975105, 10575074, 10635010）
作者： HUANG Hongwei YE Chao XU Yijun YUAN Yuan SHI Guofeng NING Zhaoyuan[1]
关键词： 等离子体密度, 相对密度, 低频率, 电子能量分布函数, 双频, 电力, 氟碳, CHF3, fluorocarbon plasma, dual-frequency discharge, low-k films etching
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期刊信息
  • 《等离子体科学与技术：英文版》
  • 主管单位:中国科学院 中国科协
  • 主办单位:中国科学院等离子体物理研究所 中国力学学会
  • 主编：万元熙、谢纪康
  • 地址：合肥市1126信箱
  • 邮编：230031
  • 邮箱：pst@ipp.ac.cn
  • 电话：0551-5591617 5591388
  • 国际标准刊号：ISSN：1009-0630
  • 国内统一刊号：ISSN：34-1187/TL
  • 邮发代号:
  • 获奖情况:
  • 国内外数据库收录:
  • 美国化学文摘（网络版）,荷兰文摘与引文数据库,美国工程索引,美国剑桥科学文摘,美国科学引文索引（扩展库）,英国科学文摘数据库
  • 被引量:89