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Improved Breakdown Voltage in AlGaN/GaN High Electron Mobility Transistors by Employing Polyimide/Ch
ISSN号:0256-307X
期刊名称:Chinese Physics Letters
时间:2013.9.9
页码:1-4
相关项目:介电/半导体集成薄膜的分子束外延生长与界面控制研究
作者:
Chu Fu-Tong|Chen Chao|Zhou Wei|Liu Xing-Zhao|
同期刊论文项目
介电/半导体集成薄膜的分子束外延生长与界面控制研究
期刊论文 35
会议论文 1
同项目期刊论文
Sodium beta-alumina thin films as gate dielectrics for AlGaN/GaN metal-insulator-semiconductor high-
Tuning two-dimensional electron gas of ferroelectric/GaN heterostructures by ferroelectric polarizat
Effects of the TiO2 buffer thickness on SrTiO3 (111) epitaxial films grown on GaN (0002)
Epitaxial growth of SrTiO3 (0 0 1) films on multilayer buffered GaN (0 0 0 2) by pulsed laser deposi
AlGaN/GaN MISHEMTs with Sodium-Beta-Alumina as the Gate Dielectrics
Modulation of 2DEG in AlGaN/GaN heterostructures by P(VDF-TrFE)
Structure and electrical characteristics of AlGaN/GaN MISHFET with Al2O3 thin film as both surface p
Significant performance enhancement in AlGaN/GaN high electron mobility transistor by high-kappa org
GaN基半导体上BiFeO_3薄膜的生长与性能研究
Integration and electrical properties of epitaxial LiNbO3 ferroelectric film on n-type GaN semicondu
GaN基底上集成介电薄膜材料的生长方法研究
Can we enhance two-dimensional electron gas from ferroelectric/GaN heterostructures?
Epitaxial Growth and Ferroelectricity of BaTiO3 on SrRuO3/TiO2 Buffered GaN
Electron trap memory characteristics of LiNbO3 film/AlGaN/GaN heterostructure
Trapping properties of LiNbO3/AlGaN/GaN metal-ferroelectric-semiconductor heterostructure characteri
Substitution of Paraelectric for Conventional Dielectric in AlGaN/GaN MISFETs
Effects of SrTiO(3)/TiO(2) buffer layer on structural and electrical properties of BiFeO(3) thin fil
Probe pressure dependence of nanoscale capacitance-voltage characteristic for AlGaN/GaN heterostruct
Normally-off characteristics of LiNbO3/AlGaN/GaN ferroelectric field-effect transistor
Study of the Integrated Growth of Dielectric Films on GaN Semiconductor Substrates
Threshold voltage modulation mechanism of AlGaN/GaN metal-insulator-semiconductor high-electron mobi
Electrical Characteristics of Pulsed Laser Deposited SrTiO3 on TiO2 Buffered AlGaN/GaN
Enhancing electrical properties of LiNbO3/AlGaN/GaN transistors by using ZnO buffers
The modulation effects of charged dielectric thin films on two-dimensional electron gas in AlGaN/GaN
以TiO_2为缓冲层在GaN上外延生长PZT铁电薄膜
无碱玻璃改性0.8BaTiO3-0.2BiYO3介电陶瓷的研究
Performance of an AIGaN/GaN MISHEMT with sodium beta-alumina for gate insulation and surface passivation
双轴应变对纤锌矿GaN、AlN、InN及其合金电子有效质量的影响
LaAlO3顶层对Pb(Zr,Ti)O3薄膜微结构和性能的影响
期刊信息
《中国物理快报:英文版》
中国科技核心期刊
主管单位:中国科学院
主办单位:中国科学院物理研究所、中国物理学会
主编:
地址:北京中关村中国科学院物理研究所内(北京603信箱《中国物理快报》编辑部)
邮编:100080
邮箱:cpl@aphy.iphy.ac.cn
电话:010-82649490 82649024
国际标准刊号:ISSN:0256-307X
国内统一刊号:ISSN:11-1959/O4
邮发代号:
获奖情况:
中国期刊方阵“双高”期刊
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美国化学文摘(网络版),美国数学评论(网络版),荷兰文摘与引文数据库,美国剑桥科学文摘,美国科学引文索引(扩展库),英国科学文摘数据库,日本日本科学技术振兴机构数据库,中国中国科技核心期刊,英国英国皇家化学学会文摘
被引量:190