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O_2流量对O_2/C_2F_6等离子体处理的硅油光致发光性能影响
  • ISSN号：1000-2073
  • 期刊名称：苏州大学学报(自然科学版)
  • 时间：2012.4.4
  • 页码：59-63+69
  • 相关项目：多频CCP/ICP混合放电等离子体源的若干关键物理问题的研究
作者： 陈天|钱侬|袁颖|叶超|
同期刊论文项目
多频CCP/ICP混合放电等离子体源的若干关键物理问题的研究
期刊论文 26 会议论文 1
同项目期刊论文
C2F6/O-2/Ar Plasma Chemistry of 60 MHz/2 MHz Dual-Frequency Discharge and Its Effect on Etching of S
Experimental Characterization of Dual-Frequency Capacitively Coupled Plasma with Inductive Enhanceme
Investigation of the effect of low energy ion beam irradiation on mono-layer grapheme
Effect of Viscosity of Silicone Oil on Aggregation Behavior of C:F Clusters on a Silicone Oil Liquid
Abnormal Enhancement of N-2(+) Emission Induced by Lower Frequency in N-2 Dual-Frequency Capacitivel
Diagnosis of a low pressure capacitively coupled argon plasma by using a simple collisional-radiativ
Investigation of Capacitively Coupled Argon Plasma Driven by Dual-Frequency with Different Frequency
Effect of Internal Antenna Coil Power on the Plasma Parameters in 13.56MHz/60MHz Dual-frequency Sput
Effect of driving frequency on plasma property in radio frequency and very high frequency magnetron
Growth of few-layer graphene on SiC at low temperature with the fluorocarbon plasma pre-etching
Reptation Aggregation of Liquid Silicon Oils Modified by Ar Plasmas
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Controllable nitrogen incorporation in HfO2 films by modulating capacitively-combined inductively-co
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Light emission from a-Si:C:O:H films fabricated by C2F6 and O-2/C2F6 plasma treating silicone oil li
Effect of Low-Frequency Power on Etching Characteristics of 6H-SiC in C4F8/Ar Dual-frequency Capacit
电感耦合放电对双频容性耦合Ar-N_2等离子体物理特性的影响
SiCOH低k介质中低表面粗糙度沟道的刻蚀研究
C_2F_6 /O_2 /Ar Plasma Chemistry of 60 MHz/2 MHz Dual-Frequency Discharge and Its Effect on Etching of SiCOH Low-k Film
Photoluminescence of silicone oil treated by fluorocarbon plasma
Effect of Low-Frequency Power on Etching Characteristics of 6H-SiC in C4F8/Ar Dual-Frequency Capacitively Coupled Plasma
Effect of Internal Antenna Coil Power on the Plasma Parameters in 13.56 MHz/60 MHz Dual-Frequency Sputtering＊
Experimental Characterization of Dual-Frequency Capacitively Coupled Plasma with Inductive Enhancement in Argon
期刊信息
  • 《苏州大学学报：自然科学版》
  • 主管单位:江苏省教育厅
  • 主办单位:苏州大学
  • 主编：郎建平
  • 地址：江苏省苏州市十梓街1号
  • 邮编：215006
  • 邮箱：fangtong@suda.edu.cn
  • 电话：0512-65225985 65225991传
  • 国际标准刊号：ISSN：1000-2073
  • 国内统一刊号：ISSN：32-1226/N
  • 邮发代号:
  • 获奖情况:
  • 国内外数据库收录:
  • 美国化学文摘（网络版）
  • 被引量:2060