位置：成果数据库 > 期刊 > 期刊详情页
Helicon Plasma Discharge in a Toroidal Magnetic Field of the Tokamak
  • ISSN号：0093-3813
  • 期刊名称：IEEE Transactions on plasma science
  • 时间：2011
  • 页码：3103-3107
  • 相关项目：多频CCP/ICP混合放电等离子体源的若干关键物理问题的研究
作者： C. G. Jin|X. M. Wu|
同期刊论文项目
多频CCP/ICP混合放电等离子体源的若干关键物理问题的研究
期刊论文 26 会议论文 1
同项目期刊论文
C2F6/O-2/Ar Plasma Chemistry of 60 MHz/2 MHz Dual-Frequency Discharge and Its Effect on Etching of S
Experimental Characterization of Dual-Frequency Capacitively Coupled Plasma with Inductive Enhanceme
Investigation of the effect of low energy ion beam irradiation on mono-layer grapheme
Effect of Viscosity of Silicone Oil on Aggregation Behavior of C:F Clusters on a Silicone Oil Liquid
Abnormal Enhancement of N-2(+) Emission Induced by Lower Frequency in N-2 Dual-Frequency Capacitivel
Diagnosis of a low pressure capacitively coupled argon plasma by using a simple collisional-radiativ
Investigation of Capacitively Coupled Argon Plasma Driven by Dual-Frequency with Different Frequency
O_2流量对O_2/C_2F_6等离子体处理的硅油光致发光性能影响
Effect of Internal Antenna Coil Power on the Plasma Parameters in 13.56MHz/60MHz Dual-frequency Sput
Effect of driving frequency on plasma property in radio frequency and very high frequency magnetron
Growth of few-layer graphene on SiC at low temperature with the fluorocarbon plasma pre-etching
Reptation Aggregation of Liquid Silicon Oils Modified by Ar Plasmas
Role of high-frequency power in C4F8 dual-frequency capacitively coupled plasmas treating high-k HfO
Controllable nitrogen incorporation in HfO2 films by modulating capacitively-combined inductively-co
Growth of graphene-like thin films at low temperature by dual-frequency capacitively coupled plasma
Light emission from a-Si:C:O:H films fabricated by C2F6 and O-2/C2F6 plasma treating silicone oil li
Effect of Low-Frequency Power on Etching Characteristics of 6H-SiC in C4F8/Ar Dual-frequency Capacit
电感耦合放电对双频容性耦合Ar-N_2等离子体物理特性的影响
SiCOH低k介质中低表面粗糙度沟道的刻蚀研究
C_2F_6 /O_2 /Ar Plasma Chemistry of 60 MHz/2 MHz Dual-Frequency Discharge and Its Effect on Etching of SiCOH Low-k Film
Photoluminescence of silicone oil treated by fluorocarbon plasma
Effect of Low-Frequency Power on Etching Characteristics of 6H-SiC in C4F8/Ar Dual-Frequency Capacitively Coupled Plasma
Effect of Internal Antenna Coil Power on the Plasma Parameters in 13.56 MHz/60 MHz Dual-Frequency Sputtering＊
Experimental Characterization of Dual-Frequency Capacitively Coupled Plasma with Inductive Enhancement in Argon