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Role of high-frequency power in C4F8 dual-frequency capacitively coupled plasmas treating high-k HfO
  • ISSN号：0022-3727
  • 期刊名称：J. Phys. D: Appl. Phys.
  • 时间：2013
  • 页码：-
  • 相关项目：多频CCP/ICP混合放电等离子体源的若干关键物理问题的研究
作者： H Y Zhang|X M Yang|T Yu|C G Jin|C Ye|L J Zhuge|X M Wu|
同期刊论文项目
多频CCP/ICP混合放电等离子体源的若干关键物理问题的研究
期刊论文 26 会议论文 1
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