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CVD两步法生长ZnO薄膜及其光致发光特性
  • ISSN号:1000-7032
  • 期刊名称:《发光学报》
  • 时间:0
  • 分类:O472.3[理学—半导体物理;理学—物理] O482.31[理学—固体物理;理学—物理]
  • 作者机构:[1]中国科学技术大学物理系,安徽合肥230026
  • 相关基金:国家自然科学基金(90201038,50472009,10474091);中国科学院知识创新方向性课题(KJCX2-SW-04-02)资助项目
中文摘要:

用CVD两步法在常压下于p型Si(100)衬底上沉积出具有较好择优取向的多晶ZnO薄膜。在325nm波长的光激发下,室温下可观察到显著的紫外光发射(峰值波长381nm)。高温退火后氧空位缺陷浓度增加,出现了一个450—600nm的绿光发光带,发光峰值在510nm。作为比较,用一步法生长的ZnO薄膜结晶质量稍差。在其PL谱中不仅有峰值波长389nm的紫外发射而且还出现了一个很强的蓝光发光中心(峰值波长437nm),退火后同样产生绿光发光带。对这两种绿光发光带的发光机制进行了研究,认为前者源于VO,而后者与OZn有密切的关系。

英文摘要:

ZnO thin films with strong (002) preferred orientation have been deposited on Si (100) substrates using two-step AP-CVD. In the two-step growth process, a ZnO buffer layer was firstly grown at 450 ℃ for 5 min, and then a top layer was grown at 350 ℃ for 20 min. A relatively high temperature buffer layer of ZnO provided a stable crystalline template for subsequent low temperature top layer to grow upon. In lattice-mismatched growth, ZnO thin film has a tensile built-in strain. The tensile strain in ZnO can be relaxed by providing sufficient thermal energy and meanwhile this relaxation process can give rise to more defects. Strong UV emission located at 381 nm is observed when excited with 325 nm light. The concentration of oxygen vacancies in the thin films increased after annealing at 800 ℃, and the 450 -600 nm green emission band is observed. PL spectra for ZnO thin films grown by one-step method show typical UV emission located at 389 nm as well as blue emission centered at 437 nm. Likewise, the band of green emission is observed in PL spectra of thin films annealed at 800 ℃. The intensity of UV emission was dramatically decreased after annealing, which could be due to the increase of the size of ZnO particles and defect concentration. For the ZnO thin film grown by twostep method, the intensity of green luminescence after annealing in oxygen became weaker than that after annealing in air, so the corresponding mechanism for green emission is attributed to VO. For the ZnO thin film grown by one-step method, the intensity of green luminescence after annealed at oxygen became stronger than that after annealing in air. The relaxation process of tensile strain preferred to give rise to more OZn defects. Therefore, the corresponding mechanism for green emission is attributed to OZn. I-V properties also indicated that the emission mechanism of OZn was reasonable.

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期刊信息
  • 《发光学报》
  • 中国科技核心期刊
  • 主管单位:中国科学院
  • 主办单位:中国物理学会发光分会 中国科学院长春光学精密机械与物理研究所
  • 主编:申德振
  • 地址:长春市东南湖大路3888号
  • 邮编:130033
  • 邮箱:fgxbt@126.com
  • 电话:0431-86176862
  • 国际标准刊号:ISSN:1000-7032
  • 国内统一刊号:ISSN:22-1116/O4
  • 邮发代号:12-312
  • 获奖情况:
  • 物理学类核心期刊,2000年获中国科学院优秀期刊二等奖,中国期刊方阵“双效”期刊
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  • 被引量:7320