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Nanoscale deformation analysis near crack-tip under residual stress in Si by high-resolution transmi
  • ISSN号：0957-4522
  • 期刊名称：Journal of Materials Science: Materials in Electro
  • 时间：2013
  • 页码：933-937
  • 相关项目：硅锗异质结构界面纳观应变场及其对光电性能的调控
作者： Liu, D.S.|Zhao, C.W.|Du, W.H.|
同期刊论文项目
硅锗异质结构界面纳观应变场及其对光电性能的调控
期刊论文 22 会议论文 1
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