利用光刻自组装技术在玻璃基板E成功制备出图案化的BiFeO3薄膜.AFM和接触角测试表明,紫外光照射引起十八烷基三氯硅烷(OTS)单层膜改性,形成憎水的自组装单分子(SAM)区域和亲水的硅烷醇区域;XRD和XPS结果显示,OTS单层膜和紫外照射处理的玻璃基板表面诱导吸附的薄膜为纯相六方扭曲钙钛矿结构的BiFeO3薄膜;SEM和EDS表明,SAM区域沉积的BiFeO3薄膜不连续,在超声波震荡下容易脱落,而硅烷醇区域沉积的BiFeO3薄膜致密均一,与基底结合牢固,边缘轮廓清晰.
Micro-patterned BiFeO3 thin films were prepared successfully on glass substrates by photolithogra- phy-self-assembly method. The characterizations of samples were carried out through XRD, SEM, AFM, XPS and EDS. The results of AFM and contact angle test show that the modification of octadecyltrichlorosilane (OTS) mono- molecular layer is achieved by UV-irradiation through a photomask, generating hydrophilic silanol areas and hydro-phobic self-assembled monolayer (SAM) regions. XRD and XPS indicate that the films absorbed to the glass substrates are pure rhombohedrally distorted structure BiFeO3. In addition, SEM and EDS are employed to confirm that no continuous BiFeO3 particles deposited on SAM regions could be easily peeled off by ultrasonication, while a uniform and clear patterned film with good adherence is site-selectively formed in the hydrophilic silanol regions.