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中文摘要：
采用短波紫外光（UV）在十八烷基三氯硅烷（OTS）自组装单分子层刻蚀不同的微型图案，利用液相自组装技术在OTS模板表面沉积HfO2图案化薄膜。通过XRD、AFM、SEM、EDS等测试手段对OTS膜和HfO2薄膜进行表征，结果表明：以OTS为模板利用液相自组装技术成功制备出边缘轮廓清晰、粗糙度较小、条纹宽度为10μm的立方晶型的HfO2图案化薄膜。
英文摘要：
Different kinds of micro-patterns were created within octadecyltrichlorosilane （OTS） self-assembled monolayers utilizing UV lithography. The HfO2 pattern films have been formed on silanol SAMs by the liquid-phase deposition （LPD） method. The crystal phase composition, microstructure and topography of the as-prepared films were characterized by various techniques, including X-ray diffraction （XRD）, scanning electron microscopy （SEM）, atomic force microscopy （AFM）, and energy disperse spectroscopy （EDS）. The results indicate that the HfO2 pattern films were successfully prepared by the self-assembled monolayers, and the thin films had cubic pattern microstructure of HfO2, 10 μm deposited lines width and small line edge roughness.
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