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New method for boron removal from silicon by electron beam injection
  • ISSN号：1369-8001
  • 期刊名称：Materials Science in Semiconductor Processing
  • 时间：2014.2.2
  • 页码：42-45
  • 相关项目：电子束注入对多晶硅Si/SiO2界面处杂质硼迁移的影响研究
作者： Yi Tan|Shiqiang Qin|Shutao Wen|Jiayan Li|Shuang Shi|Dachuan Jiang|Dayu Pang|
同期刊论文项目
电子束注入对多晶硅Si/SiO2界面处杂质硼迁移的影响研究
期刊论文 21 专利 5
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