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Research on new method of electron beam candle melting used for removal of P from molten Si
  • ISSN号：1432-8917
  • 期刊名称：Materials Research Innovations
  • 时间：2011.11.11
  • 页码：406-409
  • 相关项目：电子束注入对多晶硅Si/SiO2界面处杂质硼迁移的影响研究
作者： Dachuan Jiang|Yi Tan|Shuang Shi|Qiang Xu|Wei Dong|Zheng Gu|Ruixun Zou|
同期刊论文项目
电子束注入对多晶硅Si/SiO2界面处杂质硼迁移的影响研究
期刊论文 21 专利 5
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