欢迎您!
东篱公司
退出
申报数据库
申报指南
立项数据库
成果数据库
期刊论文
会议论文
著 作
专 利
项目获奖数据库
位置:
成果数据库
>
期刊
> 期刊详情页
AlGaN/GaN HEMTs with 0.2μm V-gate recesses for X-band application
ISSN号:0253-4177
期刊名称:半导体学报
时间:0
页码:-
相关项目:GaN基毫米波功率器件与材料基础与关键技术研究
作者:
Wang Chong|Wang Chong|Hao Yue|Hao Yue|Ma Xiaohua|Ma Xiaohua|Zhang Jincheng|Zhang Jincheng|He Yunlong|He Yunlong|Zheng Xuefeng|Zheng Xuefeng|Hao Yue|Hao Yue|Ma Xiaohua|Ma Xiaohua|Zhang Jincheng|Zhang J
同期刊论文项目
GaN基毫米波功率器件与材料基础与关键技术研究
期刊论文 134
会议论文 8
同项目期刊论文
The experiential fit of the capacitance-voltage characteristics of the AlGaN/AlN/GaN high electron m
最大振荡频率为200GHz的蓝宝石衬底AlGaN/GaN HEMT(英文)
Gate-Recessed AlGaN/GaN MOSHEMTs with the Maximum Oscillation Frequency Exceeding 120 GHz on Sapphir
Improvements in (11(2)over-bar2) semipolar GaN crystal quality by graded superlattices
Gate-structure optimization for high frequency power AlGaN/GaN HEMTs
Growth of InGaN and double heterojunction structure with InGaN back barrier
Effect of varying layouts on the gate temperature for multi-finger AlGaN/GaN HEMTs
High performance AlGaN/GaN HEMTs with 2.4 μm source-drain spacing
增强型AlGaN/GaN高电子迁移率晶体管高温退火研究
Role of Ti/Al relative thickness in the formation mechanism of Ti/Al/Ni/Au Ohmic contacts to AlGaN/G
A Ka-band 22 dBm GaN amplifier MMIC
The physical process analysis of the capacitance-voltage characteristics of AlGaN/AlN/GaN high elect
A revised approach to Schottky parameter extraction for GaN HEMT
A Ku-band 3.4 W/mm power AlGaN/GaN HEMT on a sapphire substrate
Investigation of passivation effects in AlGaN/GaN metal-insulator-semiconductor high electron-mobili
AlGaN/AlN/GaN高电子迁移率器件的电容电压特性的经验拟合
非故意掺杂与半绝缘GaN缓冲层上的AlGaN/GaN异质结构的高温电子输运特性
晶格匹配InAlN/GaN和InAlN/AlN/GaN材料二维电子气输运特性研究
高电子迁移率晶格匹配InAlN/GaN材料研究
Characteristics of AlGaN/GaN/AlGaN double heterojunction HEMTs with an improved breakdown voltage
Effect of defects on strain state in nonpolar a-plane GaN
Transport characteristics of AlGaN/GaN/AlGaN double heterostructures with high electron mobility
Effect of Si doping in wells of AlGaN/GaN superlattice on the characteristics of epitaxial layer
Improvement of breakdown characteristics of an AlGaN/GaN HEMT with a U-type gate foot for millimeter
Proton irradiation effects on HVPE GaN
Reliability of SiN-based MIM capacitors in GaN MMIC
Neutron irradiation effects on AlGaN/GaN high electron mobility transistors
斜切蓝宝石衬底MOCVD生长GaN薄膜的透射电镜研究
Influence of double AlN buffer layers on the qualities of GaN films prepared by metal-organic chemic
Characteristics of AIGaN/GaN/AIGaN double heterojunction HEMTs with an improved breakdown voltage
AlGaN/GaN HEMTs with 0.2μm V-gate recesses for X-band application
A Ku band internally matched high power GaN HEMT amplifier with over 30% of PAE
Effect of varying layouts on the gate temperature for multi-finger AIGaN/GaN HEMTs
A Ku-band high power density AlGaN/GaN HEMT monolithic power amplifier
High performance AIGaN/GaN HEMTs with 2.4 μm source-drain spacing
An 8 GHz high power AlGaN/GaN HEMT VCO
Stress, structural and electrical properties of Si-doped GaN film grown by MOCVD
Ka波段16W脉冲功率放大器的研制
氮化物MOCVD反应室流场的仿真与分析
Degradation mechanism of two-dimensional electron gas density in high Al-content AlGaN/GaN heterostructures
AlGaN/GaN MIS-HEMT using NbAlO dielectric layer grown by atomic layer deposition
最大振荡频率为200GHz的蓝宝石衬底AlGaN/GaN HEMT
Improvement of breakdown characteristics of an A1GaN/GaN HEMT with a U-type gate foot for millimeter-wave power application