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Improvements in (11(2)over-bar2) semipolar GaN crystal quality by graded superlattices
  • ISSN号：0040-6090
  • 期刊名称：Thin Solid Films
  • 时间：0
  • 页码：1909-1912
  • 相关项目：GaN基毫米波功率器件与材料基础与关键技术研究
作者： Xu, S. R.|Xu, S. R.|Zhang, J. C.|Zhang, J. C.|Cao, Y. R.|Cao, Y. R.|Zhou, X. W.|Zhou, X. W.|Xue, J. S.|Xue, J. S.|Lin, Z. Y.|Lin, Z. Y.|Ma, J. C.|Ma, J. C.|Bao, F.|Bao, F.|Hao, Y.|Hao, Y.|
同期刊论文项目
GaN基毫米波功率器件与材料基础与关键技术研究
期刊论文 134 会议论文 8
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The experiential fit of the capacitance-voltage characteristics of the AlGaN/AlN/GaN high electron m
最大振荡频率为200GHz的蓝宝石衬底AlGaN/GaN HEMT(英文)
Gate-Recessed AlGaN/GaN MOSHEMTs with the Maximum Oscillation Frequency Exceeding 120 GHz on Sapphir
Gate-structure optimization for high frequency power AlGaN/GaN HEMTs
Growth of InGaN and double heterojunction structure with InGaN back barrier
Effect of varying layouts on the gate temperature for multi-finger AlGaN/GaN HEMTs
High performance AlGaN/GaN HEMTs with 2.4 μm source-drain spacing
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Role of Ti/Al relative thickness in the formation mechanism of Ti/Al/Ni/Au Ohmic contacts to AlGaN/G
A Ka-band 22 dBm GaN amplifier MMIC
The physical process analysis of the capacitance-voltage characteristics of AlGaN/AlN/GaN high elect
A revised approach to Schottky parameter extraction for GaN HEMT
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AlGaN/AlN/GaN高电子迁移率器件的电容电压特性的经验拟合
非故意掺杂与半绝缘GaN缓冲层上的AlGaN/GaN异质结构的高温电子输运特性
晶格匹配InAlN/GaN和InAlN/AlN/GaN材料二维电子气输运特性研究
高电子迁移率晶格匹配InAlN/GaN材料研究
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Effect of defects on strain state in nonpolar a-plane GaN
AlGaN/GaN HEMTs with 0.2μm V-gate recesses for X-band application
Transport characteristics of AlGaN/GaN/AlGaN double heterostructures with high electron mobility
Effect of Si doping in wells of AlGaN/GaN superlattice on the characteristics of epitaxial layer
Improvement of breakdown characteristics of an AlGaN/GaN HEMT with a U-type gate foot for millimeter
Proton irradiation effects on HVPE GaN
Reliability of SiN-based MIM capacitors in GaN MMIC
Neutron irradiation effects on AlGaN/GaN high electron mobility transistors
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Influence of double AlN buffer layers on the qualities of GaN films prepared by metal-organic chemic
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AlGaN/GaN HEMTs with 0.2μm V-gate recesses for X-band application
A Ku band internally matched high power GaN HEMT amplifier with over 30% of PAE
Effect of varying layouts on the gate temperature for multi-finger AIGaN/GaN HEMTs
A Ku-band high power density AlGaN/GaN HEMT monolithic power amplifier
High performance AIGaN/GaN HEMTs with 2.4 μm source-drain spacing
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Stress, structural and electrical properties of Si-doped GaN film grown by MOCVD
Ka波段16W脉冲功率放大器的研制
氮化物MOCVD反应室流场的仿真与分析
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AlGaN/GaN MIS-HEMT using NbAlO dielectric layer grown by atomic layer deposition
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Improvement of breakdown characteristics of an A1GaN/GaN HEMT with a U-type gate foot for millimeter-wave power application