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Hydrophobic TixOy-CmHn nanoparticle film prepared by plasma enhanced chemical vapor deposition
  • ISSN号：1672-5220
  • 期刊名称：Journal of Dong Hua University (english Edition)
  • 时间：0
  • 页码：227-232
  • 分类：TQ134.11[化学工程—无机化工] O484.1[理学—固体物理;理学—物理]
  • 作者机构：[1]College of Material Science and Engineering, State Key Laboratory for Modification of Chemical Fibers and Polymer Materials, Donghua University, Shanghai 201620, China, [2]College of Science, Donghua University, Shanghai 201620, China
  • 相关基金：Foundation items： National Natural Science Foundations of China （No. 10835004, No. 10775031 ）; Science and Technology Commission of Shanghai Municipality, China （ No.10XD1400100）
  • 相关项目：常压脉冲射频辉光等离子体中的物理机理与稳定控制研究
作者： Wang D.-X.|Xu J.-Z.|Liu W.|Guo Y.|Yang Q.-Y.|Ding K.|Shi J.-J.|Zhang J.|
关键词： 等离子体增强化学气相沉积法, 纳米颗粒膜, 疏水性, 紫外可见分光光度计, 傅里叶变换红外光谱, 扫描电子显微镜, 透射电子显微镜, 二氧化钛, micro/nano structure, plasma-enhanced chemical vapor deposition （PECVD） hydrophobic titanium oxide
中文摘要：

Correspondence should be addressed to ZHANG Jing, E-mail ： jingzh@ dhu. edu. cn

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常压脉冲射频辉光等离子体中的物理机理与稳定控制研究
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期刊信息
  • 《东华大学学报：英文版》
  • 主管单位:国家教育部
  • 主办单位:东华大学
  • 主编：
  • 地址：上海延安路西1882
  • 邮编：200051
  • 邮箱：xuebao@dhu.edu.cn
  • 电话：021-62373948
  • 国际标准刊号：ISSN：1672-5220
  • 国内统一刊号：ISSN：31-1920/N
  • 邮发代号:
  • 获奖情况:
  • EI、CA等收录
  • 国内外数据库收录:
  • 俄罗斯文摘杂志,美国化学文摘（网络版）,荷兰文摘与引文数据库,美国工程索引,英国科学文摘数据库,英国世界纺织文摘
  • 被引量:130