位置：成果数据库 > 期刊 > 期刊详情页
Mask-filtering-based inverse lithography
  • ISSN号：1932-5150
  • 期刊名称：Journal of Micro/ Nanolithography, Mems, and Moems
  • 时间：2013
  • 页码：1-13
  • 相关项目：基于广义椭偏仪的纳米结构三维形貌参数测量理论与方法研究
作者： Lv, Wen|Xia, Qi|Liu, Shiyuan|
同期刊论文项目
基于广义椭偏仪的纳米结构三维形貌参数测量理论与方法研究
期刊论文 25 会议论文 18
同项目期刊论文
Optimal Design of High-Aspect-Ratio Micro-Nano Hierarchical Structures Mimicking Gecko Foot-Hairs
Generalized formulations for aerial image based lens aberration metrology in lithographic tools with
Fast aerial image simulations using one basis mask pattern for optical proximity correction
Fast Evaluation of Aberration-Induced Intensity Distribution in Partially Coherent Imaging Systems b
Fast algorithm for quadratic aberration model in optical lithography based on cross triple correlati
Formulation of error propagation and estimation in grating reconstruction by a dual-rotating compens
Efficient source mask optimization with Zernike polynomial functions for source representation
计算测量问题与求解方法初探
Fitting-determined formulation of effective medium approximation for 3D trench structures in model-b
Kernel-based parametric analytical model of source intensity distributions in lithographic tools
Fabrication of high aspect ratio microfiber arrays that mimic gecko foot hairs
基于Sigmoid函数的离轴照明光源全参数解析模型
Estimation of the convergence order of rigorous coupled-wave analysis for binary gratings in optical
Fast aerial image simulations for partially coherent systems by transmission cross coefficient decom
Level-set-based inverse lithography for mask synthesis using the conjugate gradient and an optimal t
Fabrication and Properties of Dual-Level Hierarchical Structures Mimicking Gecko Foot Hairs
Depolarization effects from nanoimprinted grating structures as measured by Mueller matrix polarimet
Improved measurement accuracy in optical scatterometry using correction-based library search
Measurement configuration optimization for accurate grating reconstruction by Mueller matrix polarim
Improved measurement accuracy in optical scatterometry using fitting error interpolation based libra
Iterative method for in situ measurement of lens aberrations in lithographic tools using CTC-based q
Identification and reconstruction of diffraction structures in optical scatterometry using support v
Convolution-variation separation method for efficient modeling of optical lithography
基于Mueller矩阵椭偏仪的纳米压印模板与光刻胶光栅结构准确测量