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Fast Evaluation of Aberration-Induced Intensity Distribution in Partially Coherent Imaging Systems b
  • ISSN号：0256-307X
  • 期刊名称：Chinese Physics Letters
  • 时间：2011.10.10
  • 页码：1-4
  • 相关项目：基于广义椭偏仪的纳米结构三维形貌参数测量理论与方法研究
作者： Liu Shi-Yuan|Liu Wei|Wu Xiao-Fei|
同期刊论文项目
基于广义椭偏仪的纳米结构三维形貌参数测量理论与方法研究
期刊论文 25 会议论文 18
同项目期刊论文
Optimal Design of High-Aspect-Ratio Micro-Nano Hierarchical Structures Mimicking Gecko Foot-Hairs
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计算测量问题与求解方法初探
Fitting-determined formulation of effective medium approximation for 3D trench structures in model-b
Kernel-based parametric analytical model of source intensity distributions in lithographic tools
Fabrication of high aspect ratio microfiber arrays that mimic gecko foot hairs
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Estimation of the convergence order of rigorous coupled-wave analysis for binary gratings in optical
Fast aerial image simulations for partially coherent systems by transmission cross coefficient decom
Level-set-based inverse lithography for mask synthesis using the conjugate gradient and an optimal t
Fabrication and Properties of Dual-Level Hierarchical Structures Mimicking Gecko Foot Hairs
Depolarization effects from nanoimprinted grating structures as measured by Mueller matrix polarimet
Mask-filtering-based inverse lithography
Improved measurement accuracy in optical scatterometry using correction-based library search
Measurement configuration optimization for accurate grating reconstruction by Mueller matrix polarim
Improved measurement accuracy in optical scatterometry using fitting error interpolation based libra
Iterative method for in situ measurement of lens aberrations in lithographic tools using CTC-based q
Identification and reconstruction of diffraction structures in optical scatterometry using support v
Convolution-variation separation method for efficient modeling of optical lithography
基于Mueller矩阵椭偏仪的纳米压印模板与光刻胶光栅结构准确测量
期刊信息
  • 《中国物理快报：英文版》
  • 中国科技核心期刊
  • 主管单位:中国科学院
  • 主办单位:中国科学院物理研究所、中国物理学会
  • 主编：
  • 地址：北京中关村中国科学院物理研究所内（北京603信箱《中国物理快报》编辑部）
  • 邮编：100080
  • 邮箱：cpl@aphy.iphy.ac.cn
  • 电话：010-82649490 82649024
  • 国际标准刊号：ISSN：0256-307X
  • 国内统一刊号：ISSN：11-1959/O4
  • 邮发代号:
  • 获奖情况:
  • 中国期刊方阵“双高”期刊
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  • 被引量:190