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Generalized formulations for aerial image based lens aberration metrology in lithographic tools with
Fast Evaluation of Aberration-Induced Intensity Distribution in Partially Coherent Imaging Systems b
Fast algorithm for quadratic aberration model in optical lithography based on cross triple correlati
Formulation of error propagation and estimation in grating reconstruction by a dual-rotating compens
Fitting-determined formulation of effective medium approximation for 3D trench structures in model-b
Estimation of the convergence order of rigorous coupled-wave analysis for binary gratings in optical
Fast aerial image simulations for partially coherent systems by transmission cross coefficient decom
Level-set-based inverse lithography for mask synthesis using the conjugate gradient and an optimal t
Depolarization effects from nanoimprinted grating structures as measured by Mueller matrix polarimet
Measurement configuration optimization for accurate grating reconstruction by Mueller matrix polarim
Improved measurement accuracy in optical scatterometry using fitting error interpolation based libra
Iterative method for in situ measurement of lens aberrations in lithographic tools using CTC-based q
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